Paper About Aerial Image Measurement Technique for Automated Reticle Defect Disposition (ARDD) in Wafer Fabs

In this paper we can get things around measurement technique, aerial image measurement, light, image qualification, pattern, and the aerial images. The paper presents discussion related to measurement system, polarization effects, transmission, measurement, aerial images, and phase.

paper about aerial image measurement technique for automated reticle defect disposition  ardd  in wafer fabs  page1 6371982 Paper About Aerial Image Measurement Technique for Automated Reticle Defect Disposition (ARDD) in Wafer Fabs paper about aerial image measurement technique for automated reticle defect disposition  ardd  in wafer fabs  page2 6371982 Paper About Aerial Image Measurement Technique for Automated Reticle Defect Disposition (ARDD) in Wafer Fabs paper about aerial image measurement technique for automated reticle defect disposition  ardd  in wafer fabs  page3 6371982 Paper About Aerial Image Measurement Technique for Automated Reticle Defect Disposition (ARDD) in Wafer Fabs

Many info about method, exposure, focus measurements, transmission loss, wafer, and measurements are presented inside this paper. The following are selected from this paper:

7 Radius of cone of light on pellicle r = 1.6 mm Pellicle h = 7.8 mm Distance of pellicle Defect on pellicle Cone of light NA = 0.2 Figure 9a: Pellicle defect directly above structure Pellicle h = 7.8 mm Distance of pellicle Radius of cone of light on pellicle r = 1.6 mm Defects on pellicle Cone of light NA = 0.2 Figure 9b: Pellicle defects at edge of cone of light above structure 5.

In addition, this paper gives you discussion about the aerial image, illumination, wavelength, image measurement, aerial image, and polarization.

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